NSOM Lithography for Organized Growth of Gap Nanowires
NSOM Lithography for Organized Growth of Gap Nanowires
Author(s): Ivana Lettrichova, Dusan Pudis, Agata Laurencikova, Stanislav Hasenohrl, Jozef Novak, Jaroslava Skriniarova, Peter GasoSubject(s): Methodology and research technology, ICT Information and Communications Technologies
Published by: Žilinská univerzita v Žilině
Keywords: NSOM lithography; predefined structure; organized nanowire growth;
Summary/Abstract: In this contribution, near field scanning optical microscope (NSOM) lithography is presented as a tool for organized growth of nanowires. Non contact mode of NSOM lithography was used to pattern planar structures in photoresist deposited on GaP substrate. In combination with lift-off technique, metal-catalyst particles on GaP substrate for subsequent growth of GaP nanowires were prepared. Different periodic and predefined arrangements of GaP nanowires were achieved.
Journal: Komunikácie - vedecké listy Žilinskej univerzity v Žiline
- Issue Year: 16/2014
- Issue No: 1
- Page Range: 21-25
- Page Count: 5
- Language: English
