X-Ray Diffraction Line Profile Analysis of Strongly Textured Thin Films of ZnO
X-Ray Diffraction Line Profile Analysis of Strongly Textured Thin Films of ZnO
Author(s): P. Šutta, Q. JackuliakSubject(s): Methodology and research technology
Published by: Žilinská univerzita v Žilině
Keywords: ZnO; Textured Thin Films; X-Ray; Diffraction Line Profile;
Summary/Abstract: ZnO thin films have been deposited on SiO2 -Si and Al-SiO2 -Si substrates by reactive sputtering. X-ray diffractometry was used to determine microstructural disorder parameters in ZnO thin films with strong preferred c-axis orientation. The influence of Al and Al2O3 buffer layer on preferred c-axis orientation and microstrain of crystallites was also studied. The microstrains and domain size showed only a small dependence on the preference of a buffer layer, but they depend on the thickness of ZnO thin film. The stress gradient along the c-axis was observed in all of studied samples.
Journal: Komunikácie - vedecké listy Žilinskej univerzity v Žiline
- Issue Year: 5/2003
- Issue No: 2
- Page Range: 37-40
- Page Count: 4
- Language: English