Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA
Patterning Techniques for Fabrication of Submicrometer Structures in Photoresist, III-V Semiconductors and PMMA
Author(s): Dusan Pudis, Jarmila Kubicova, Lubos Suslik, Jaroslava Skriniarova, Ivan Martincek, Ivan NovotnySubject(s): Methodology and research technology
Published by: Žilinská univerzita v Žilině
Keywords: Submicrometer Structures; Photoresist; Patterning Techniques;
Summary/Abstract: This paper presents experimental results in the field of planar periodic structures, their fabrication and analysis. We demonstrate techniques and experimental results of fabrication of two-dimensional periodic structures and their preparation in a thin photoresist layer, III-V semiconductors and PMMA - interference lithography using two coherent laser beams, nanoimprint lithography and lithography using nearfield scanning optical microscope.
Journal: Komunikácie - vedecké listy Žilinskej univerzity v Žiline
- Issue Year: 12/2010
- Issue No: 2
- Page Range: 53-57
- Page Count: 5
- Language: English
