INFLUENCE OF PULSED ARC ENERGETIC CONDENSATION ON DEPOSITION OF ta-C FILMS Cover Image

ВЛИЯНИЕ НА ВИСОКО ЕНЕРГИЙНО ИМПУЛСНО-ДЪГОВО КАТОДНО РАЗПРАШАВАНЕ ПРИ ОТЛАГАНЕ НА СВОБОДНИ ОТ ВОДОРОД ТЕТРАХЕДРАЛНИ АМОРФНИ ВЪГЛЕРОДНИ ПОКРИТИЯ (ta-C)
INFLUENCE OF PULSED ARC ENERGETIC CONDENSATION ON DEPOSITION OF ta-C FILMS

Author(s): Ivaylo S. Dolchinkov
Subject(s): Essay|Book Review |Scientific Life, Scientific Life
Published by: Бургаски свободен университет
Keywords: Tetrahedral amorphous Carbon, ta-C; Energetic impinging ions; Subplantation; Pulsed arc technic; sp2 (graphite-like) and sp3 (diamond-like) bonds
Summary/Abstract: The physical properties of deposited Carbon-based films are strongly dependent on the ratio of sp2 (graphite-like) to sp3 (diamond-like) bonds. In the “Subplantation model” of Lifshitz et al. and of Robertson, incident ions of sufficient energy penetrate the surface of the growing film, enter interstitial subsurface and increase the local density. The ions with lower energy will not be able to penetrate the surface and will form sp2 bonds. Thus, the structure of the deposited films is mainly determined by the energy of the impinging the substrate Carbon ions and the following relaxation effect linked with the temperature during deposition. For this study films were deposited using pulsed arc technic. There are clear facts how deposition rate influences the nano-hardness and roughness of the coatings. It was also found that dopants can significantly increase the deposition rates.

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